{"id":181,"date":"2023-05-11T18:28:28","date_gmt":"2023-05-11T09:28:28","guid":{"rendered":"http:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/?page_id=181"},"modified":"2025-06-27T10:15:41","modified_gmt":"2025-06-27T01:15:41","slug":"achievement","status":"publish","type":"page","link":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/achievement\/","title":{"rendered":"Publications"},"content":{"rendered":"\n<h2 class=\"wp-block-heading\">Publications (\uff5e2025, 5)<\/h2>\n\n\n\n<div style=\"height:40px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p><strong>2025<\/strong><\/p>\n\n\n\n<p>&nbsp;\u201cComplete crack elimination in strained SiGe\/Ge(111) heterostructures by pre-patterning of Si(111)\nsubstrates\u201d<br>M. Nagao, R. Mizoguchi, Y. Shibahara, K. Shikatake, M. Yamada, K. Hamaya and K. Sawano<br>Applied Physics Express 18, 055504 (2025).<br>DOI:  <a href=\"https:\/\/iopscience.iop.org\/article\/10.35848\/1882-0786\/add83c\" target=\"_blank\" rel=\"noopener\">\/10.35848\/1882-0786\/add83c<\/a><\/p>\n\n\n\n<p>&nbsp;\u201cRoom-temperature spin transport through band-to-band tunneling at semiconductor p-n junctions\u201d<br>K. Oki, S. Ueda, T. Usami, S. Fujii, S. Kikuoka, K. Yamamoto, K. Sawano and K. Hamaya<br>Physical Review Applied 23, L051005-1- L051005-6 (2025).<br>DOI:  <a href=\"https:\/\/journals.aps.org\/prapplied\/abstract\/10.1103\/PhysRevApplied.23.L051005\" target=\"_blank\" rel=\"noopener\">\/10.1103\/PhysRevApplied.23.L051005<\/a><\/p>\n\n\n\n<p>&nbsp;\u201cObservation of intravalley spin scattering in a doped multivalley semiconductor\u201d\n<br>K. Hamaya, T. Okada, K. Kawashima, T. Naito, K. Oki, S. Kikuoka, Y. Wagatsuma, M. Yamada and K. Sawano<br>Phys. Rev. B 111, L081301 (2025).<br>DOI:  <a href=\"https:\/\/doi.org\/10.1103\/PhysRevB.111.L081301\" target=\"_blank\" rel=\"noopener\">\/10.1103\/PhysRevB.111.L081301<\/a><\/p>\n\n\n\n<p>&nbsp;\u201cDrastic enhancements of direct and indirect light emissions from Ge microbridge web-structures via efficient light confinements\u201d\n<br>Takahiro Inoue, Ayaka Odashima, Masaki Nagao, and Kentarou Sawano<br>Applied Physics Express 18, 012001 (2025).<br>DOI:  <a href=\"https:\/\/doi.org\/10.35848\/1882-0786\/ada086\" target=\"_blank\" rel=\"noopener\">\/10.35848\/1882-0786\/ada086<\/a><\/p>\n\n\n\n<div style=\"height:40px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p><strong>2024<\/strong><\/p>\n\n\n\n<p>&nbsp;\u201cCrystallographic Orientations of Cracks Formed in SiGe\/Ge\/Si(111)\u201d<br>Kota Tajima, Junji Yamanaka, Keisuke Arimoto, Kosuke O. Hara, Youya Wagatsuma and Kentarou Sawano<br>Microscopy and Microanalysis 30 (Suppl 1), 573\u2013575 (2024). <br>DOI:  <a href=\"https:\/\/doi.org\/10.1093\/mam\/ozae044.267\" target=\"_blank\" rel=\"noopener\">\/10.1093\/mam\/ozae044.267<\/a><\/p>\n\n\n\n<p>&nbsp;\u201cEnhancement of room temperature electroluminescence from strained SiGe\/Ge(111) multiple quantum wells light emitting diodes\u201d<br>Shuya Kikuoka, Rena Kanesawa, Michihiro Yamada, Kohei Hamaya, Kentarou Sawano<br>Materials Science in Semiconductor Processing 176, 108299 (2024). <br>DOI:  <a href=\"https:\/\/doi.org\/10.1016\/j.mssp.2024.108299\" target=\"_blank\" rel=\"noopener\">\/10.1016\/j.mssp.2024.108299<\/a><\/p>\n\n\n\n<p>&nbsp;\u201cFabrication of crack-free strained SiGe\/Ge multiple quantum wells on Ge-on-Si(111) by the patterning method\u201d<br>R. Kanesawa, S. Kikuoka, Y. Shibahara, Y. Wagatsuma, M. Yamada, K. Hamaya and K. Sawano<br>Materials Science in Semiconductor Processing 177, 108300 (2024). <br>DOI:  <a href=\"https:\/\/doi.org\/10.1016\/j.mssp.2024.108300\" target=\"_blank\" rel=\"noopener\">\/10.1016\/j.mssp.2024.108300<\/a><\/p>\n\n\n\n<p>&nbsp;\u201cGrowth of all-epitaxial Co2MnSi\/Ge\/Co2MnSi vertical spin-valve structures on Si\u201d<br>Atsuya Yamada, Michihiro Yamada, Shuhei Kusumoto, Julio A. do Nascimento, Connor Murrill, Shinya Yamada, Kentarou Sawano, Vlado K. Lazarov, Kohei Hamaya<br>Materials Science in Semiconductor Processing 173, 108140 (2024).  <br>DOI:  <a href=\"https:\/\/doi.org\/10.1016\/j.mssp.2024.108140\" target=\"_blank\" rel=\"noopener\">\/10.1016\/j.mssp.2024.108140<\/a><\/p>\n\n\n\n<p>&nbsp;\u201cAl\u2013Ge-paste-induced liquid phase epitaxy of Si-rich SiGe(111) for epitaxial Co-based Heusleralloys\u201d <br>Michihiro Yamada, Shota Suzuki, Ai I. Osakae, Kazuaki Sumi, Takahiro Inoue, Azusa N. Hattori, Shinya Yamada, Kentarou Sawano, Marwan Dhamrin, Kohei Hamaya<br>Materials Science in Semiconductor Processing 174, 108232 (2024). <br>DOI:  <a href=\"https:\/\/doi.org\/10.1016\/j.mssp.2024.108232\" target=\"_blank\" rel=\"noopener\">\/10.1016\/j.mssp.2024.108232<\/a><\/p>\n\n\n\n<p>&nbsp;\u201cEffect of Sn doping on low-temperature growth of Ge epilayers on half-metallic Co2FeSi\u201d <br>Michihiro Yamada, Shuhei Kusumoto, Atsuya Yamada, Kentarou Sawano, Kohei Hamaya<br>Materials Science in Semiconductor Processing 171, 107987 (2024). <br>DOI:  <a href=\"https:\/\/doi.org\/10.1016\/j.mssp.2024.107987\" target=\"_blank\" rel=\"noopener\">10.1016\/j.mssp.2023.107987<\/a><\/p>\n\n\n\n<div style=\"height:40px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p><strong>2023<\/strong><\/p>\n\n\n\n<p>&nbsp;\u201cElectrical properties of a low-temperature fabricated Ge-based top-gate MOSFET structure with epitaxial ferromagnetic Heusler-alloy Schottky-tunnel source and drain\u201d<br>Keisuke Yamamoto, Takuro Matsuo, Michihiro Yamada, Youya Wagatsuma, Kentarou Sawano, Kohei Hamaya<br>Materials Science in Semiconductor Processing 167, 107763 (2023). <br>DOI: <a href=\"https:\/\/doi.org\/10.1016\/j.mssp.2024.107763\" target=\"_blank\" rel=\"noopener\">10.1016\/j.mssp.2023.107763<\/a><\/p>\n\n\n\n<p>&nbsp;\u201cTellurium nanosheets with structural anisotropy formed from defective MoTe2 multilayers\u201d <br>Shuto Muranaka, Satoshi Nogamida, Kosuke O. Hara, Kentarou Sawano and Yusuke Hoshi<br>AIP Advances 13, 075219 (2023).  <br>DOI:  <a href=\"https:\/\/doi.org\/10.1063\/5.0155417\" target=\"_blank\" rel=\"noopener\">10.1063\/5.0155417<\/a><\/p>\n\n\n\n<p>&nbsp;\u201cSignificant reduction of crack propagation in the strained SiGe\/Ge(111) induced by the local growth on the depth controlled area patterning\u201d<br>Youya Wagatsuma, Rena Kanesawa, Md. Mahfuz Alam, Kazuya Okada, Takahiro Inoue, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano<br>Applied Physics Express 16, 015502 (2023)&nbsp;&nbsp;&nbsp;<br>DOI: <a href=\"https:\/\/doi.org\/10.35848\/1882-0786\/aca751\" target=\"_blank\" rel=\"noreferrer noopener\">10.35848\/1882-0786\/aca751<\/a><\/p>\n\n\n\n<p>&nbsp;\u201cInfluences of lattice strain and SiGe buffer layer thickness on electrical characteristics of strained Si\/SiGe\/Si(110) heterostructures\u201d<br>Taisuke Fujisawa, Atsushi Onogawa, Miki Horiuchi, Yuichi Sano, Chihiro Sakata, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa and Keisuke Arimoto<br>Materials Science in Semiconductor Processing 161 (2023) 107476&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;<br>DOI:&nbsp;&nbsp;<a href=\"https:\/\/doi.org\/10.1016\/j.mssp.2023.107476\" target=\"_blank\" rel=\"noreferrer noopener\">10.1016\/j.mssp.2023.107476<\/a><\/p>\n\n\n\n<p>&nbsp;\u201cDzyaloshinskii-Moriya interaction at epitaxial ferromagnet\/semiconductor interface\u201d<br>Shuto Kimura, Michihiro Yamada, Takumi Okuno, Kentarou Sawano, Kohei Hamaya and Kazuya Ando<br>Physical Review B 108, 094441 (2023).<br>DOI:&nbsp;&nbsp;<a href=\"https:\/\/doi.org\/10.1103\/PhysRevB.108.094441\" target=\"_blank\" rel=\"noreferrer noopener\">10.1103\/PhysRevB.108.094441<\/a><\/p>\n\n\n\n<div style=\"height:40px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p><strong>2022<\/strong><\/p>\n\n\n\n<p>\u201cFabrication of SiGe\/Ge microbridges based on Ge-on-Si(110) and observation of resonant light emission\u201d<br>T. Inoue, Y. Wagatsuma, R. Ikegaya, K. Okada, K. Sawano<br>Journal of Crystal Growth 590, 126682 (2022).<br>DOI: <a href=\"https:\/\/doi.org\/10.1016\/j.jcrysgro.2022.126682\" target=\"_blank\" rel=\"noreferrer noopener\">10.1016\/j.jcrysgro.2022.126682<\/a><\/p>\n\n\n\n<p>\u201cMechanism of crack formation in strained SiGe(111) layers\u201d<br>Youya Wagatsuma, Md. Mahfuz Alam, Kazuya Okada, Rena Kanesawa, Michihiro Yamada, Kohei Hamaya, and Kentarou Sawano<br>Journal of Crystal Growth 589, 126672 (2022).<br>DOI: <a href=\"https:\/\/doi.org\/10.1016\/j.jcrysgro.2022.126672\" target=\"_blank\" rel=\"noreferrer noopener\">10.1016\/j.jcrysgro.2022.126672<\/a><\/p>\n\n\n\n<p>\u201cSignificant effect of interfacial spin moments in ferromagnet-semiconductor heterojunctions on spin transport in a semiconductor\u201d<br>T. Naito, R. Nishimura, M. Yamada, A. Masago, Y. Shiratsuchi , Y. Wagatsuma, K. Sawano, R. Nakatani, T. Oguchi, and K. Hamaya<br>Physical Review B 105, 195308 (2022)<br>DOI: <a href=\"https:\/\/doi.org\/10.1103\/PhysRevB.105.195308\" target=\"_blank\" rel=\"noreferrer noopener\">10.1103\/PhysRevB.105.195308<\/a><\/p>\n\n\n\n<p>\u201cStrong room-temperature EL emission from Ge-on-Si(111) diodes\u201d<br>Yuwa Sugiura, Masashi Sasaki, Youya Wagatsuma, Koudai Yamada, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano<br>Journal of Crystal Growth 594, 126766 (2022).<br>DOI: <a href=\"https:\/\/doi.org\/10.1016\/j.jcrysgro.2022.126766\" target=\"_blank\" rel=\"noreferrer noopener\">10.1016\/j.jcrysgro.2022.126766<\/a><\/p>\n\n\n\n<p>\u201cTemperature Dependence of Two-Terminal Local Magnetoresistance in Co-Based Heusler Alloy\/Ge Lateral Spin-Valve Devices\u201d<br>Michihiro Yamada, Takahiro Naito, Kazuaki Sumi, Kentarou Sawano, and Kohei Hamaya<br>IEEE Transactions on Magnetics 58, 4100505 (2022).<br>DOI: <a href=\"https:\/\/doi.org\/10.1109\/TMAG.2022.3145393\" data-type=\"page\" data-id=\"181\" target=\"_blank\" rel=\"noreferrer noopener\">10.1109\/TMAG.2022.3145393<\/a><\/p>\n\n\n\n<p>\u201cStrain engineering of heteroepitaxial SiGe\/Ge on Si with various crystal orientations\u201d<br>Md. Mahfuz Alam, Youya Wagatsuma, Kazuya Okada, Michihiro Yamada, Kohei Hamaya, and Kentarou Sawano<br>ECS Transactions, 109 (4) 197-204 (2022)<br>DOI: <a href=\"https:\/\/doi.org\/10.1149\/10904.0197ecst\" target=\"_blank\" rel=\"noreferrer noopener\">10.1149\/10904.0197ecst<\/a><\/p>\n\n\n\n<p>\u201cFabrication of Thick SiGe\uff0fGe Multiple Quantum Wells on Ge-on-Si and Their Optical Properties\u201d<br>Rena Kanesawa, Youya Wagatsuma, Syuya Kikuoka, Yuwa Sugiura, Kentarou Sawano<br>ECS Transactions, 109 (4) 289-295 (2022)<br>DOI: <a href=\"https:\/\/doi.org\/10.1149\/10904.0289ecst\" target=\"_blank\" rel=\"noreferrer noopener\">10.1149\/10904.0289ecst<\/a><\/p>\n\n\n\n<p>\u201cFabrication of branch-like bridges based on Ge-on-Si (110) and observation of resonant light emission\u201d<br>Takahiro Inoue, Youya Wagatsuma, Reo Ikegaya, Ayaka Odashima, Masaki Nagao, Kentarou Sawano<br>ECS Transactions, 109 (4) 297-302 (2022)<br>DOI: <a href=\"https:\/\/doi.org\/10.1149\/10904.0297ecst\" target=\"_blank\" rel=\"noreferrer noopener\">10.1149\/10904.0297ecst<\/a><\/p>\n\n\n\n<div style=\"height:40px\" aria-hidden=\"true\" class=\"wp-block-spacer\"><\/div>\n\n\n\n<p><strong>2021<\/strong><\/p>\n\n\n\n<p>\u201cA drastic increase in critical thickness for strained SiGe by growth on mesa-patterned Ge-on-Si\u201d<br>Youya Wagatsuma, Md. Mahfuz Alam, Kazuya Okada, Michihiro Yamada, Kohei Hamaya, and Kentarou Sawano<br>Applied Physics Express 14, 025502 (2021).\u3000\u3000\u3000<br>DOI: <a href=\"https:\/\/doi.org\/10.35848\/1882-0786\/abd4c5\" target=\"_blank\" rel=\"noreferrer noopener\">\/10.35848\/1882-0786\/abd4c5<\/a><\/p>\n\n\n\n<p>\u201cEnhanced electroluminescence from Ge-on-Si by precise in-situ doping and post-annealing\u201d<br>Kodai Yamada, Youya Wagatsuma, Kazuya Okada, Yusuke Hoshi, and Kentarou Sawano<br>Applied Physics Express 14, 045504 (2021).<br>DOI: <a href=\"https:\/\/doi.org\/10.35848\/1882-0786\/abf0df\" target=\"_blank\" rel=\"noreferrer noopener\">\/10.35848\/1882-0786\/abf0df<\/a><\/p>\n\n\n\n<p>\u201cRoom-temperature two-terminal magnetoresistance ratio reaching 0.1% in semiconductor-based lateral devices with L21-ordered Co2MnSi\u201d<br>K. Kudo, M. Yamada, S. Honda, Y. Wagatsuma, S. Yamada, K. Sawano, and K. Hamaya<br>Appl. Phys. Lett. 118, 162404 (2021).<br>DOI: <a href=\"https:\/\/doi.org\/10.1063\/5.0045233\" target=\"_blank\" rel=\"noreferrer noopener\">\/10.1063\/5.0045233<\/a><\/p>\n\n\n\n<p>&#8220;Effect of Fe atomic layers at the ferromagnet-semiconductor interface on temperature-dependent spin transport in semiconductors&#8221;<br>M. Yamada, Y. Shiratsuchi, H. Kambe, K. Kudo, S. Yamada, K. Sawano, R. Nakatani and K. Hamaya<br>J. Appl. Phys. 129, 183901 (2021)<br>DOI: <a href=\"https:\/\/doi.org\/10.1063\/5.0048321\" target=\"_blank\" rel=\"noreferrer noopener\">\/10.1063\/5.0048321<\/a><\/p>\n\n\n\n<p>\u201cDependences of the hole mobility in the strained Si pMOSFET and gated Hall bars formed on SiGe\/Si(110) on the channel direction and the strained Si thickness\u201d<br>Keisuke Arimoto, Taisuke Fujisawa, Daichi Namiuchi, Atsushi Onogawa, Yuichi Sano, Daisuke Izumi, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa<br>Journal of Crystal Growth 571, 126246 (2021).<br>DOI: <a href=\"https:\/\/doi.org\/10.1016\/j.jcrysgro.2021.126246\" target=\"_blank\" rel=\"noreferrer noopener\">\/10.1016\/j.jcrysgro.2021.126246<\/a><\/p>\n\n\n\n<p>\u201cMagnetoresistance ratio of more than 1% at room temperature in germanium vertical spin-valve devices with Co2FeSi\u201d<br>A. Yamada, M. Yamada, M. Honda, S. Yamada, K. Sawano, and K. Hamaya<br>Appl. Phys. Lett. 119, 192404 (2021).<br>DOI: <a href=\"https:\/\/doi.org\/10.1063\/5.0061504\" target=\"_blank\" rel=\"noreferrer noopener\">\/10.1063\/5.0061504<\/a><\/p>\n\n","protected":false},"excerpt":{"rendered":"Publications (\uff5e2025, 5) 2025 &nbsp;\u201cComplete crack elimination in strained SiGe\/Ge(111) heterostructures by pr [&hellip;]","protected":false},"author":2,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-181","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/pages\/181","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/comments?post=181"}],"version-history":[{"count":38,"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/pages\/181\/revisions"}],"predecessor-version":[{"id":1315,"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/pages\/181\/revisions\/1315"}],"wp:attachment":[{"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/media?parent=181"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}