{"id":237,"date":"2023-05-11T20:49:42","date_gmt":"2023-05-11T11:49:42","guid":{"rendered":"http:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/?page_id=237"},"modified":"2025-10-27T15:21:59","modified_gmt":"2025-10-27T06:21:59","slug":"photogallery","status":"publish","type":"page","link":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/photogallery\/","title":{"rendered":"Photo gallery"},"content":{"rendered":"\n

In laboratory<\/h3>\n\n\n\n

2025<\/h4>\n\n\n\n
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Sample preparation for laser lithography\u2460<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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Sample preparation for laser lithography\u2461<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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D3M2 Farewell party<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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Barbecue<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n<\/div>\n\n\n\n
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Growing SiGe crystal by MBE<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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<\/figure>\n<\/div>\n\n\n\n
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<\/figure>\n<\/div>\n\n\n\n
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<\/figure>\n<\/div>\n<\/div>\n\n\n\n

2024<\/h4>\n\n\n\n
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wafer transfer in MBE\u2460<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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wafer transfer in MBE\u2461<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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wafer transfer in MBE\u2462<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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wafer transfer in MBE\u2463<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n<\/div>\n\n\n\n
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setting a wafer on X-ray diffraction equipment\u2460<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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setting a wafer on X-ray diffraction equipment\u2461<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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chemical treatment for SiGe substrates at draft chamber<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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bonder wiring with optical microscope<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n<\/div>\n\n\n\n
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at cafeteria (the clean room is seen in the back)<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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Sample preparation for Hall measurement\u2460<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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Sample preparation for Hall measurement\u2461<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n
<\/div>\n<\/div>\n\n\n\n

2023<\/h4>\n\n\n\n
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Maintenance of MBE\u2460<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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Maintenance of MBE\u2461<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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Maintenance of MBE\u2462<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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Maintenance of MBE\u2463<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n<\/div>\n\n\n\n
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Maintenance of MBE\u2464<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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MBE sample loading\u2460<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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MBE sample loading\u2461<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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In air shower<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n<\/div>\n\n\n\n
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working at draft<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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semi clean room from outside<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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measuring in semi clean room<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
<\/div>\n<\/div>\n\n\n\n
<\/div>\n\n\n\n

Back number<\/h3>\n\n\n\n

2015<\/h5>\n\n\n\n
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with 300 mm Si wafer<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
<\/div>\n\n\n\n
<\/div>\n\n\n\n
<\/div>\n<\/div>\n\n\n\n
2014<\/h5>\n\n\n\n
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in front of Advanced Research Laboratories<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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in front of MBE<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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Maintenance of MBE<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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Characterization<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n<\/div>\n\n\n\n
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Sample loading in MBE<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
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Substrate cleaning at draft<\/figcaption><\/figure>\n<\/figure>\n<\/div>\n\n\n\n
<\/div>\n\n\n\n
<\/div>\n<\/div>\n","protected":false},"excerpt":{"rendered":"In laboratory 2025 2024 2023 Back number 2015 2014","protected":false},"author":2,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-237","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/pages\/237","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/comments?post=237"}],"version-history":[{"count":62,"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/pages\/237\/revisions"}],"predecessor-version":[{"id":1323,"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/pages\/237\/revisions\/1323"}],"wp:attachment":[{"href":"https:\/\/www.comm.tcu.ac.jp\/nano_slabo\/en\/wp-json\/wp\/v2\/media?parent=237"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}